Structure and Photocatalytic Properties Films Based on Aluminosilicates

Purpose. Synthesis micro- and nanometer-thick aluminosilicate films by electrochemical methods and systematically study the influence of their structural and geometrical characteristics on the band structure and photocatalytic properties. 

Methods. Thin-film coatings of aluminosilicates were obtained on an aluminum substrate by electrolysis of Na₂SiO₃ and NaOH solutions of different concentrations at constant voltage in the range from 8 V to 30 V. The surface was studied by atomic force microscopy, the specific surface area was determined by methylene blue adsorption. The width of the forbidden zone has been established by diffuse reflectance spectra.

Results. The film coatings based on high silica aluminosilicates close to the structure of MFI and FAU were obtained. It was found that the surface of the samples at 8 V voltage - globular with a diameter of globules from 500 nm to 2.5 microns, with increasing voltage - the formation of a crystal structure whose elements are parallelepipeds with the length of the edges not exceeding 250 nm. The thickness of the films varies in the range from ~1.0 µm to ~18.5 µm, and the specific surface area from ~250 m²/g to ~650 m²/g depending on the synthesis conditions. The mechanism of aluminosilicate coating formation was proposed. The narrowing of the band gap width of the aluminosilicates up to 3.10-3.32 eV has been detected.  The increase in the catalytic activity of the structures occurs with an increase in the voltage at which they were obtained, which can be explained by an increase in the specific surface area of the material and, consequently, by an increase in the concentration of active centers and the contact area with the dye molecules.  

Conclusion. The results presented in this work are of interest in studying the properties of two-dimensional objects, as well as in obtaining new functional materials based on aluminosilicates with high catalytic activity.

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