Structural and morphological features of magnetron nanofilms of TaN with different thicknesses

Purpose of research. Study of morphological and phase changes in the structure of tantalum nitride nanofilms formed by magnetron reactive sputtering on a silicon substrate.

Methods. Magnetron sputtering on a silicon substrate was performed using the MVU TM-Magna T setup with the sputtering time parameter changing from 300 to 900 sec, and also with constant power parameters of 500 W and working gas pressure of Ar 0,5 Pa. The morphological and phase changes in the structure of tantalum nitride nanofilms were studied using atomic force microscopy and X-ray phase analysis. The fractal dimension was determined using the cube counting method. X-ray diffractometric analysis in the in situ measurement mode with discrete heating (in 100 °C increments) in air up to 1000 °C using the PAAR HTK-16 high-temperature attachment.

Results. Using atomic force microscopy methods, it was found that the granulometric distribution of nanoclusters in the studied TaN nanofilms was Gaussian and an increase in the lateral size of particles was observed with an increase in the deposition time. The nanofilm with a deposition time of 300 s had minimal roughness. The statistical fractal dimension was calculated, the value of which corresponded to their three-dimensionality. According to the X-ray phase analysis data, the sizes of the coherence region, texturing, microdeformations and interplanar deformation distortions were determined, and a mixed Stranski-Krastanov mechanism of nanofilm formation was established.

Conclusion. The surface roughness of nitride nanofilms formed at a constant power (500 W) depends significantly on the magnetron sputtering time and N2 concentration. In all studied nanofilm structures, the dominant growth mechanism was the mixed Stranski–Krastanov mechanism.

1. Erofeev E.V., Polyntsev E.S., Ishutkin S.V. Study of thin-film resistors based on Tantalum nitride, obtained by reactive magnetron sputtering, for radiophotonics devices. Applied Physics. 2021;(5):93–98. (In Russ.) https://doi.org/10.51368/1996-0948-2021-5-93-98

2. Elangovan T., Murugeshan S., Mangalaraj D., Kuppusami P., Shabhana Khan, Sudha C., et al. Synthesis and high temperature XRD studies of tantalum nitride thin films prepared by reactive pulsed dc magnetron sputtering. Journal of Alloys and Compounds. 2011;509:6400–6407. https://doi.org/10.1016/j.jallcom.2011.03.067

3. Dastan D., Shan K., Jafari A., Gity F., Yin X., Shi Z., et al. Influence of nitrogen concentration on electrical, mechanical, and structural properties of tantalum nitride thin films prepared via DC magnetron sputtering. Applied Physics. 2022;128:400. https://doi.org/10.1007/s00339-022-05501-4

4. Bernoulli D., Müller U., Schwarzenberger M., Hauert R., Spolenak R. Magnetron sputter deposited tantalum and tantalum nitride thin films: An analysis of phase, hardness and composition. Thin Solid Films. 2013;548:157–161. https://doi.org/10.1016/j.tsf.2013.09.055

5. Firouzabadi S.S., Naderi M., Dehghani K., Mahboubi F. Effect of nitrogen flow ratio on nanomechanical properties of tantalum nitride thin film. Journal of Alloys and Compounds. 2017;719:63–70. https://doi.org/10.1016/j.jallcom.2017.05.159

6. Kuzmenko A.P., Kolpakov A.I., Sizov A.S., Emelyanov V.M., Neruchev Yu.A. Magnetron carbon structures obtained by high-frequency magnetron sputtering in Argon and Nitrogen. Proceedings of the Southwest State University. Seties: Engineering and Technology. 2024;14(2):71–87. (In Russ.) https://doi.org/10.21869/2223-1528-2024-14-2-71-87

7. Kuzmenko A.P., Dint N., Kuzko A.E., Min Than M., Sin Win T., Kolpakov A.I. Nanoscale characterization of Cr, Cu, Al and Ni metallic magnetron nanofilm multilayers on sitall. Izvestia vysshikh uchebnykh zavedenii. Materialy electronnoi tekhniki = Materials of Electronics Engineering. 2016;19(3):195–203. (In Russ.) https://doi.org/10.17073/1609-3577-2016-3-195-203

8. Movchan B.A., Demchishin A.V. Study of the structure and properties of thick vacuum condensates of nickel, titanium, tungsten, aluminum oxide and zirconium dioxide. Physics of metals and metal science. 1969;28(4):23–30. (In Russ.)

9. Zhou W., Cao Y., Zhao H., Li Z., Feng P., Feng F. Fractal analysis on surface topography of thin films: a review. Fractal and Fractional. 2022;6(3):135. https://doi.org/10.3390/fractalfract6030135

10. Gusev A.I. Nanomaterials, nanostructures, nanotechnology. Moscow: Fizmatlit, 2005. 416 p. (In Russ.)

11. Kuzmenko A.P., Kuzko A.E., Dint N., Min Than M., Kanukov R.T. Degradation processes during heating in air in magnetron nanofilms of Ni and Cr. Izvestiya Yugo-Zapadnogo gosudarstvennogo universiteta. Seriya: Tekhnika i tekhnologii = Proceedings of the Southwest State University. Seties: Engineering and Technology. 2016;2(19):153–165. (In Russ.)

12. Seifried F., Leiste H., Schwaiger R., Ulrich S., Seifert H.J., Stueber M. Structure, morphology and selected mechanical properties of magnetron sputtered (Mo, Ta, Nb) thin films on NiTi shape memory alloys. Surface and Coatings Technology. 2018;347:379–389. https://doi.org/10.1016/j.surfcoat.2018.05.014

13. Nieto A., Guzman M., Conde-Gallardo A., Contreras O. Synthesis of superconductive TaN thin films by reactive DC sputtering. Journal of Electronic Materials. 2022;51:4649–4658. https://doi.org/10.1007/s11664-022-09721-5

14. Nie H.B., Xu S.Y., Wang S.J., You L.P., Yang Z., Ong C.K., et al. Structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputtering. Applied Physics. 2001;73:229–236. https://doi.org/10.1007/s003390000691

15. Zhang M., Wang Y., Song S., Guo R., Zhang W., Li C., et al. Influence of room-temperature oxidation on stability and performance of reactively sputtered TaN thin films for high-precision sheet resistors. Surfaces and Interfaces. 2024;46:104088. https://doi.org/10.1016/j.surfin.2024.104088

16. Lee D.W., Kim Y.N., Cho M.Y., Ko P.J., Lee D., Koo S.M., et al. Reliability and characterristics of magnetron sputter deposited tantalum nitride for thin film resistors. Thin Solid Films. 2018;660:688–694. https://doi.org/10.1016/j.tsf.2018.04.016

17. Kumar M., Mishra S., Mitra R. Effect of Ar:N2 ratio on structure and properties of Ni-TiN nanocomposite thin films processed by reactive RF/DC magnetron sputtering. Surface and Coatings Technology. 2013;228:100–114. https://doi.org/10.1016/j.surfcoat.2013.04.014

18. Li Z., Zhang Y., Wang Y., Li J., Zhao H. Effect of nitrogen flow ration on degradation behaviors and failure of magnetron sputter deposited tantalum nitride. Coatings. 2021;11:1133. https://doi.org/10.3390/coatings11091133

19. Kuzmenko A.P., Gusev E.O., Rodionov V.V., Sizov A.S., Mirgorod Yu.A., Than M. Structural and morphological features of hfn magnetron nanofilms with varying thickness. Izvestiya YugoZapadnogo gosudarstvennogo universiteta. Seriya: Tekhnika i tekhnologii =Proceedings of the Southwest State University. Seties: Engineering and Technology. 2022;12(4):110–123. (In Russ.) https://doi.org/10.21869/2223-1528-2022-12-4-110-123

20. Ataie S.A., Keshtmand R., Zamani-Meymian M.R. Nano-mechanical properties of Cr-Zr-NbN medium entropy alloy films produced by reactive sputtering. International Journal of Refractory Metals and Hard Materials. 2023;110:106006. https://doi.org/10.1016/j.ijrmhm.2022.106006

21. Samuel J.J., Kumar P.K., Kumar D.D., Kamalan Kirubaharan A.M., Arjun Raj T., Aravind P. Effect of substrate temperature and preferred orientation on the tribological properties properties of Tantalum nitride coatings. Materials today: proceedings. 2021;44:4404–4408. https://doi.org/10.1016/j.matpr.2020.10.576

22. Noda S., Tepsanongsuk K., Tsuji Y., Kajikawa Y., Ogawa Y., Komiyama H. Preferred orientation and film structure of TaN films deposited by reactive magnetron sputtering. Journal of Vacuum Science and Technology. 2004;22(2):332–338. https://doi.org/10.1116/1.1647593

23. Kim I.S., Cho M.Y., Lee D.W., Ko P.J, Shin W.H., Park C., Oh J.M. Degradation behaviors and failure of magnetron sputter deposited tantalum nitride. Thin Solid Films. 2020;697:137821. https://doi.org/10.1016/j.tsf.2020.137821

24. Concalves A.F., Sinfronio F.S., de Menezes A.S., Mendes A.M. Thermo analytical characte- rization of Tantalum oxide in the process for the development of tantalum nitride photoelectrodes. Materials today communications. 2022;32:104122. https://doi.org/10.1016/j.mtcomm.2022.104122

25. Gholami M., Khojier K., Monsefi M., Borghei S.M. Fabrication and characterization of TaxN thin films deposited by dc magnetron sputtering technique: application in microelectronic devices. Brazilian Journal of Physics. 2022;52:171. https://doi.org/10.1007/s13538-022-01164-x